INTEGRATED FERROELECTRICS（集成铁电体杂志）影响因子_期刊投稿发表

期刊简介

Integrated Ferroelectrics provides an international, interdisciplinary forum for electronic engineers and physicists as well as process and systems engineers, ceramicists, and chemists who are involved in research, design, development, manufacturing and utilization of integrated ferroelectric devices. Such devices unite ferroelectric films and semiconductor integrated circuit chips. The result is a new family of electronic devices, which combine the unique nonvolatile memory, pyroelectric, piezoelectric, photorefractive, radiation-hard, acoustic and/or dielectric properties of ferroelectric materials with the dynamic memory, logic and/or amplification properties and miniaturization and low-cost advantages of semiconductor i.c. technology.

集成铁电体为电子工程师和物理学家以及工艺和系统工程师、陶瓷学家和化学家提供了一个国际性的、跨学科的论坛，他们参与了集成铁电体器件的研究、设计、开发、制造和利用。这种器件将铁电膜和半导体集成电路芯片结合在一起。其结果是一系列新的电子器件，它们将铁电材料的独特的非易失性存储、热电、压电、光折射、抗辐射、声学和/或介电特性与半导体集成电路的动态存储、逻辑和/或放大特性以及小型化和低成本优点相结合。技术。

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